E-ISSN 3026-930X
 

Original Research 


Enhanced microstructure of Coated Ti-51at. %Ni coated TiN using DC PVD magnetron sputtering technique

Ishiaka Shaibu Arudi, Samson Balogun.


Abstract
The use of TiN alloys for biomedical implant has gained an attractive attention over the last decade. But there is still a drawback in terms of its adequate adhesive and hardness coefficient. This study investigated the efficiency of an advanced coating and characterization of titanium nitride (TiN) on Ti-51at. %Ni alloy. Using X-ray diffraction (XRD), scanning electron microscopy (SEM), and optical microscopy (OM) and surface topography and roughness of the sample. vapor deposition DC magnetron sputtering technique with variable deposition parameters such as sputtering power, pressure, time, and temperature. A microhardness tester and micro scratch test equipment were employed to test the hardness and adhesion strength of the coated and uncoated samples of Coated sample of Ti-51at. %Ni respectively. The investigation indicates that precipitates that the grain boundaries as B2, R-phase, and TiNi3 intermetallics. It was found that the coated samples have a higher surface roughness of Ra 6.95 nm compared to uncoated samples with a surface roughness of 3.69 nm. The mechanical test also revealed that the coated sample has good adhesion strength with a value as high as 2175 mN, and its hardness increased by 57% compared with the uncoated sample. The hardness of the coated sample indicated an increment of 57%, and the adhesion strength of the coated sample, determined by the scratch test, gave a value of 2174.96 mN. Finally, the coating of Ti-51at. %Ni with TiN with the DC magnetron sputtering system yielded good hardness and adhesion to resist wear in implants for biomedical applications

Key words: Titanium, Hard coating, sputtering; Physical vapour deposition, Surface roughness; Mechanical properties


 
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Pubmed Style

Arudi IS, Balogun S. Enhanced microstructure of Coated Ti-51at. %Ni coated TiN using DC PVD magnetron sputtering technique. NJEAS. 2025; 2(2): -. doi:10.5455/NJEAS.194771


Web Style

Arudi IS, Balogun S. Enhanced microstructure of Coated Ti-51at. %Ni coated TiN using DC PVD magnetron sputtering technique. https://www.nilejeas.com/?mno=194771 [Access: March 05, 2025]. doi:10.5455/NJEAS.194771


AMA (American Medical Association) Style

Arudi IS, Balogun S. Enhanced microstructure of Coated Ti-51at. %Ni coated TiN using DC PVD magnetron sputtering technique. NJEAS. 2025; 2(2): -. doi:10.5455/NJEAS.194771



Vancouver/ICMJE Style

Arudi IS, Balogun S. Enhanced microstructure of Coated Ti-51at. %Ni coated TiN using DC PVD magnetron sputtering technique. NJEAS. (2025), [cited March 05, 2025]; 2(2): -. doi:10.5455/NJEAS.194771



Harvard Style

Arudi, I. S. & Balogun, . S. (2025) Enhanced microstructure of Coated Ti-51at. %Ni coated TiN using DC PVD magnetron sputtering technique. NJEAS, 2 (2), -. doi:10.5455/NJEAS.194771



Turabian Style

Arudi, Ishiaka Shaibu, and Samson Balogun. 2025. Enhanced microstructure of Coated Ti-51at. %Ni coated TiN using DC PVD magnetron sputtering technique. Nile Journal of Engineering and Applied Science, 2 (2), -. doi:10.5455/NJEAS.194771



Chicago Style

Arudi, Ishiaka Shaibu, and Samson Balogun. "Enhanced microstructure of Coated Ti-51at. %Ni coated TiN using DC PVD magnetron sputtering technique." Nile Journal of Engineering and Applied Science 2 (2025), -. doi:10.5455/NJEAS.194771



MLA (The Modern Language Association) Style

Arudi, Ishiaka Shaibu, and Samson Balogun. "Enhanced microstructure of Coated Ti-51at. %Ni coated TiN using DC PVD magnetron sputtering technique." Nile Journal of Engineering and Applied Science 2.2 (2025), -. Print. doi:10.5455/NJEAS.194771



APA (American Psychological Association) Style

Arudi, I. S. & Balogun, . S. (2025) Enhanced microstructure of Coated Ti-51at. %Ni coated TiN using DC PVD magnetron sputtering technique. Nile Journal of Engineering and Applied Science, 2 (2), -. doi:10.5455/NJEAS.194771